Lab Pro Hydrofluoric Acid and DI Water, 1:20 custom mix, 100ml

$45.00
Description
  • Product Name
    Hydrofluoric Acid and DI Water, 1:20 Custom Mix
  • Mix Ratio
    1:20 (HF : DI Water)
  • Components
    Hydrofluoric Acid, Deionized Water
  • Form
    Aqueous Solution
  • Volume
    100 mL

Description

What is Hydrofluoric Acid and DI Water, 1:20 Custom Mix?

Hydrofluoric Acid and DI Water, 1:20 custom mix is an aqueous solution consisting of hydrofluoric acid diluted with deionized water. This solution is used within semiconductor cleaning processes.

This solution:

  • Combines hydrofluoric acid (HF) and deionized water (DIW)
  • Is used as a diluted hydrofluoric acid solution
  • Is associated with wafer cleaning systems in semiconductor fabrication

Key Features

  • Hydrofluoric acid diluted with deionized water
  • 1:20 HF to DI water ratio
  • Aqueous solution
  • Custom mixed
  • Used in semiconductor cleaning operations

Common Applications

  • Wafer cleaning processes in semiconductor fabrication
  • Use in spray acid chambers
  • Interface-controlled chemical delivery systems
  • Cleaning steps requiring diluted hydrofluoric acid

Packaging Details

  • Packaged In: 100 mL container
  • Includes: Single unit

Legal & Safety Notice

This product is supplied for industrial and semiconductor processing use. Proper handling and use in accordance with applicable safety procedures and regulations is the responsibility of the end user.

Standards and Certifications

  • Lab Pro CofA
  • Lab Pro SDS
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Properties

Chemical Components Hydrofluoric Acid, Deionized Water
Mix Ratio 1:20
Form Aqueous solution
Typical End Use Silicon wafer cleaning
Volume 100 mL


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