- Key performance benefit: Foamtec UltraSOLV® ScrubPAD 800 Diamond Grit pads are engineered for precision cleaning in semiconductor environments. The 800 diamond grit ensures efficient removal of residues, optimizing equipment performance and reducing downtime.
- Material & construction: Constructed with high-quality diamond abrasives, these pads are designed to handle rigorous cleaning tasks. The robust construction ensures durability and consistent performance across various semiconductor equipment.
- Risk reduction / compliance benefit: Designed to minimize particle contamination, these pads help maintain the integrity of sensitive semiconductor processes. The low particle generation is crucial for compliance with stringent industry standards.
- Protection level: Safe for use on diverse materials, including aluminum, stainless steel, ceramic, and quartz, these pads offer excellent protection without damaging sensitive surfaces. The low ionic residue further ensures no new contaminants are introduced.
- Comfort & usability: With a user-friendly design, these pads allow for quick and thorough cleaning, reducing equipment downtime. Their versatility in grit options provides tailored cleaning actions for different surface materials.
- Safety & compliance assurance: Washed to reduce harmful ionic residues, these pads meet safety and compliance requirements, ensuring a clean and safe working environment.
Recommended For
- Wafer fabrication facilities
- CVD tool maintenance
- PECVD equipment cleaning
- Dry etch tool upkeep
- PVD process cleaning
- Ion implant tool maintenance
Primary Industries
- Semiconductor manufacturing
- Electronics production
- Cleanroom environments
- Precision engineering
Standards and Certifications
- California Prop 65 Warning
Product Details
- SKU: HT4580D-10
- Grit: 800 Diamond Grit
- Packaging: 10 ScrubPADS/Pack, 10 Packs/Case
- Total Quantity: 100 ScrubPADS per case
- Safe for Surfaces: Aluminum, stainless steel, ceramic, glass, quartz, anodized surfaces
- Particle Reduction: Engineered to minimize particle generation
- Ionic Residue: Low ionic residue due to washed abrasives



